Since the birth of nanoimprint technology in 1995, with the advantages of high resolution, low cost, high yield, etc., it has quickly become the focus of academia and industry, and is regarded as a milestone of nano optics, and is rated as "one of the top ten emerging technologies that will change the world" by MIT Science and Technology Weekly. It is also included in the International Semiconductor Industry Technology Development Blueprint (ITRS).

At present, the cutting-edge technology of nanoimprint continues to emerge. The nano-imprint lithography device developed by Canon uses inkjet and photographic technology to drop resin onto semiconductor wafers and then print a circuit with a mask, with a line width of up to 5 nanometers or even 2 nanometers, low power consumption and lower cost, which is expected to break the bottleneck of semiconductor manufacturing. Mold manufacturing technology is also constantly innovating. In the past, the rigid template had high accuracy but only applied to the flat surface. Now, the flexible template made of PDMS material with high elastic modulus can fit different surfaces, solving the problems of limited processing range and easy falling off. With the development of quantum computing, biomedicine and other fields, nanoimprint technology is also expanding its application boundaries.