Since its inception in 1995, nanoimprint technology has rapidly become a focal point of attention in both academic and industrial circles due to its advantages of high resolution, low cost, and high throughput. Regarded as a milestone in nanophotonic , it was named by MIT Technology Review as "one of the top ten emerging technologies that will change the world" and has been incorporated into the International Technology Roadmap for Semiconductors (ITRS).

At present, the cutting-edge advancements in nanoimprint continue to emerge. Canon's developed nanoimprint lithography equipment employs inkjet and photographic technologies to dispense resin onto semiconductor wafers, which are then imprinted with a mask to form circuits. This process achieves line widths as small as 5 nanometers—and even challenges the 2-nanometer threshold—with lower power consumption and costs, holding promise to break through bottlenecks in semiconductor manufacturing. Meanwhile, mold fabrication technologies are undergoing continuous innovation. Traditional rigid templates offer high precision but are limited to planar surfaces, whereas flexible templates made from PDMS materials with high elastic modulus can conform to diverse surfaces, addressing issues such as restricted processing ranges and easy release failure. With the development of quantum computing, biomedical, and other fields, nanoimprint technology is also expanding its application boundaries.