Photolithography is a kind of image reproduction technology, which realizes the transmission of the pattern by drawing the structure pattern of large-scale integrated circuit device on the mask on the photoresist coated silicon wafer. The minimum size of the finished product is directly related to the resolution obtained by the lithography system, and reducing the wavelength of the irradiating light source is the most effective way to improve the resolution. Therefore, the development of new short-wavelength light source lithography machine has been a research hotspot in various countries. In addition to the improvement of light source technology, according to the interference characteristics of light, the use of various wavefront technology to optimize the process parameters is also an important means to improve the resolution. The technology of phase-shift mask, off-axis illumination and proximity effect correction are all breakthroughs in this background, which can obtain higher resolution lithographic graphics at the current technical level.

On September 12, 2024, the "New Generation Semiconductor Process Technology Forum: Advances in Lithography and Nanoimprint Technology" will discuss topics such as high-end lithography machine technology, cutting-edge lithography processes, and advanced materials, semiconductor optical lithography and extreme ultraviolet lithography. The forum will invite integrated circuit related enterprises, optical related enterprises, and experts and scholars to share their research progress and frontier prospects in the research and development of lithography technology.